ion-beam deposition

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• Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… …   Wikipedia

• ion-beam deposition — jonpluoštis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam deposition vok. Abscheidung durch Ionenstrahl, f; Ionenstrahlabscheidung, f; Ionenstrahlaufdampfung, f rus. ионно лучевое осаждение, n; ионно пучковое… …   Radioelektronikos terminų žodynas

• Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

• Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… …   Wikipedia

• Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

• Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… …   Wikipedia

• Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… …   Wikipedia

• Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… …   Wikipedia

• déposition par faisceau ionique — jonpluoštis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. ion beam deposition vok. Abscheidung durch Ionenstrahl, f; Ionenstrahlabscheidung, f; Ionenstrahlaufdampfung, f rus. ионно лучевое осаждение, n; ионно пучковое… …   Radioelektronikos terminų žodynas

• Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and …   Wikipedia

• Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… …   Wikipedia